Definition
Line edge roughness (LER) is the stochastic variation of a patterned line edge from its ideal position along the length of the feature.
Application
Used as a lithography and pattern-transfer metric because LER contributes to critical-dimension variability and can affect device performance and yield at small feature sizes.
Related search terms
LER; edge roughness
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Related concepts
Evidence and further reading
- Evidence from nist.govhttps://www.nist.gov/publications/cd-sem-measurement-line-edge-roughness-test-patterns-193-nm-lithography
- Evidence from nist.govhttps://www.nist.gov/publications/determination-optimal-parameters-cd-sem-measurement-line-edge-roughness