Chemical Filter

03 Cleanroom, Vacuum, Gases & Facilities

Definition

An air or gas filter that uses sorbent or reactive media to remove airborne molecular contaminants such as acids, bases and organic vapors rather than primarily removing solid particles.

Application

Used in semiconductor cleanrooms, lithography areas, process-tool air paths and small controlled environments to protect wafers, optics, reticles and equipment from molecular contamination that HEPA or ULPA particle filtration alone does not address.

Related search terms

AMC filter; molecular-contamination filter

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Related concepts

Evidence and further reading

  • Evidence from entegris.comhttps://www.entegris.com/shop/en/USD/Products/Gas-Filtration-and-Purification/AMC-Filters/Facility-Filtration/c/cleanroomairfilters
  • Evidence from entegris.comhttps://www.entegris.com/en/home/products/gas-filtration-and-purification/amc-filters.html