Definition
The preferential redistribution or partitioning of dopant atoms at an interface or between adjacent materials or phases, producing local dopant enrichment and depletion relative to the original profile.
Application
Encountered or intentionally exploited during silicidation, heterostructure processing and other thermal/interface reactions; segregation can change contact barriers, carrier profiles, junction behavior and contact resistance and therefore must be modeled or controlled.
Related search terms
Dopant pile-up; impurity segregation
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Related concepts
Evidence and further reading
- Evidence from research.ibm.comhttps://research.ibm.com/publications/dopant-segregation-in-soi-schottky-barrier-mosfets
- Evidence from research.ibm.comhttps://research.ibm.com/publications/low-temperature-diffusion-of-dopant-atoms-in-silicon-during-interfacial-silicide-formation