Definition
A nondestructive optical metrology technique that measures the change in polarization of light after reflection or transmission from a sample and fits the response to determine material properties such as film thickness and optical constants.
Application
Used to characterize semiconductor thin films including oxides, nitrides, semiconductors and metals; spectroscopic and in-situ implementations can monitor film thickness, optical properties, growth or etch rate and process endpoint.
Related search terms
Thin-film ellipsometry; optical ellipsometry
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Related concepts
Evidence and further reading
- Evidence from jawoollam.comhttps://www.jawoollam.com/resources/ellipsometry-tutorial/what-is-ellipsometry
- Evidence from jawoollam.comhttps://www.jawoollam.com/products/ise-ellipsometer