Definition
An optical technique that measures wavelength-dependent changes in light polarization after interaction with a sample and fits an optical model to infer film thickness and optical constants.
Application
Used to characterize semiconductor thin films and multilayer structures, including the thickness and optical properties of oxide films on silicon.
Related concepts
Evidence and further reading
- Evidence from jawoollam.comhttps://www.jawoollam.com/download/pdfs/jawoollamco-brochure.pdf
- Evidence from nist.govhttps://www.nist.gov/publications/characterization-thin-sio2-si-spectroscopic-ellipsometry-neutron-reflectometry-and-x