Definition
An EUV source is the light-generation subsystem that produces extreme-ultraviolet radiation near 13.5 nm for EUV lithography, commonly by using a high-power laser to create a tin plasma whose emitted EUV light is collected and delivered to the scanner optics.
Application
EUV source power and stability directly affect scanner throughput and dose control; higher usable power at the wafer enables faster exposures while maintaining the required resist dose.
Related search terms
Extreme-ultraviolet light source; LPP EUV source
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Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/en/products/euv-lithography-systems/twinscan-nxe-3600d
- Evidence from asml.comhttps://www.asml.com/en/technology/lithography-principles/light-and-lasers