Definition
Exposure is the lithography step in which a patterned optical image or radiation field delivers a controlled dose to photoresist on a wafer, changing the resist chemistry so the pattern can be developed.
Application
In projection lithography, the exposure system aligns the wafer and mask, controls focus and dose, and exposes each field or scans the reticle image so subsequent development produces the resist pattern used for etch, implant, or deposition-related pattern transfer.
Related search terms
Lithography exposure; resist exposure
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Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/en/products/euv-lithography-systems/twinscan-nxe-3600d
- Evidence from asml.comhttps://www.asml.com/en/products/duv-lithography-systems/twinscan-xt-260