Definition
An exposure tool is lithography equipment that selectively exposes resist on a substrate using a controlled radiation source, with implementations including contact-mask exposure and mask/reticle projection.
Application
Projection steppers and scanners perform repeated field-by-field or scanning patterning across wafers while controlling overlay, focus, dose, and imaging performance; DUV and EUV scanners are central examples in semiconductor fabs.
Related search terms
Lithography scanner; stepper; scanner
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Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/en/products/euv-lithography-systems/twinscan-nxe-3600d
- Evidence from nist.govhttps://www.nist.gov/laboratories/tools-instruments/nanofab-tool-suss-microtec-maba6-gen4-mask-aligner