Definition
Extreme ultraviolet lithography (EUV lithography) is a semiconductor patterning technology that uses approximately 13.5 nm wavelength light and reflective optics to image very small features from a reflective mask onto photoresist-coated wafers.
Application
EUV reduces the need for some multi-patterning sequences at advanced logic and memory nodes and is used to print critical layers where shorter wavelength and high numerical aperture improve achievable resolution and patterning complexity.
Related search terms
EUV lithography; EUVL
Search phrases help you find this entry; their meaning depends on the context shown here.
Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/en/products/euv-lithography-systems/twinscan-nxe-3600d
- Evidence from asml.comhttps://www.asml.com/products/euv-lithography-systems/twinscan-exe-5000