Definition
A lithography process-characterization experiment that prints a matrix of fields over intentionally varied focus and exposure-dose settings.
Application
Used to determine best focus, nominal dose, process window, and depth-of-focus/exposure latitude for a resist-patterning process.
Related search terms
Focus Exposure Matrix; FEM
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Related concepts
Evidence and further reading
- Evidence from wiki.nanofab.ucsb.eduhttps://wiki.nanofab.ucsb.edu/wiki/ASML_Stepper_3_Standard_Operating_Procedure
- Evidence from wiki.nanofab.ucsb.eduhttps://wiki.nanofab.ucsb.edu/wiki/Lithography_Calibration_-_Analyzing_a_Focus-Exposure_Matrix