Definition
In lithography, the range of wafer focus positions over which the projected image or printed resist feature remains within specified image, profile and critical-dimension requirements.
Application
A key lithography process-window metric. Wafer flatness, topography and scanner focus errors consume the DOF budget; wavelength, numerical aperture and resolution-enhancement methods influence usable focus latitude.
Related search terms
Lithography focus latitude; usable focus range
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Related concepts
Evidence and further reading
- Evidence from optics.ansys.comhttps://optics.ansys.com/hc/en-us/articles/360042256993-Lithography-Methodology
- Evidence from ir.kla.comhttps://ir.kla.com/news-events/press-releases/detail/350/kla-tencor-introduces-complete-measurement-solution-for