Definition
An optical-system parameter that describes the angular range of light collected or delivered by the imaging optics; in projection lithography, increasing numerical aperture improves achievable resolution at a given wavelength and process factor.
Application
A key lithography parameter in the Rayleigh resolution relationship, used when setting and comparing imaging capability for DUV and EUV exposure systems.
Related search terms
numerical aperture
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Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/en/technology/lithography-principles/lenses-and-mirrors
- Evidence from asml.comhttps://www.asml.com/en/technology/lithography-principles/rayleigh-criterion