Definition
A post-development thermal treatment that hardens and stabilizes a patterned photoresist, removes residual solvent, and can improve adhesion and etch resistance.
Application
Used before etch or other pattern-transfer steps when a more durable resist mask is needed, with temperature controlled to avoid pattern deformation.
Related concepts
Evidence and further reading
- Evidence from imicromaterials.comhttps://www.imicromaterials.com/technical/lithography-process-overview
- Evidence from nist.govhttps://www.nist.gov/laboratories/tools-instruments/nanofab-tool-suss-microtec-acs200-automated-resist-coater