Definition
Immersion lithography is optical projection lithography in which a high-refractive-index liquid, typically ultra-pure water, fills the gap between the final projection lens and wafer to raise numerical aperture and improve resolution.
Application
Semiconductor fabs use 193 nm immersion scanners to pattern critical layers at advanced nodes, often together with computational correction and multiple-patterning techniques.
Related search terms
193 nm immersion lithography; water immersion lithography
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Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/news/press-releases/2003/asml-introduces-industry-first-immersion-lithography-tool
- Evidence from asml.comhttps://www.asml.com/en/news/press-releases/2004/albany-nanotech-pioneers-193nm-immersion-lithography-rd-with