Definition
Liquid-based wafer cleaning that applies high-frequency acoustic energy to promote particle and contaminant removal while process conditions are controlled to limit feature damage.
Application
Used for pre-process and post-process wafer cleaning, including post-CMP particle removal and cleaning of patterned surfaces.
Related search terms
megasonic wafer cleaning
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Related concepts
Evidence and further reading
- Evidence from ir.appliedmaterials.comhttps://ir.appliedmaterials.com/news-releases/news-release-details/applied-materials-extends-copperlow-k-leadership-innovative-cmp
- Evidence from scientific.nethttps://www.scientific.net/SSP.195.209