Definition
A photoresist class containing metal-oxide-based components, developed for high-resolution extreme-ultraviolet patterning where high EUV absorption and patterning performance are required.
Application
Used as an imaging material in advanced EUV and High-NA EUV lithography to print dense nanoscale features before pattern transfer.
Related search terms
metal oxide photoresist; metal-oxide photoresist
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Related concepts
Evidence and further reading
- Evidence from imec-int.comhttps://www.imec-int.com/en/events/spie-advanced-lithography-patterning-0
- Evidence from imec-int.comhttps://www.imec-int.com/en/press/imec-achieves-new-milestones-single-patterning-high-na-euv-lithography-both-damascene-and