Definition
High-NA EUV is extreme-ultraviolet lithography using a higher numerical-aperture projection optic, notably 0.55 NA systems, to improve imaging resolution beyond 0.33 NA EUV tools.
Application
High-NA EUV is intended for patterning smaller semiconductor features and reducing patterning complexity at advanced logic and memory nodes as the technology enters manufacturing readiness.
Related search terms
0.55 NA EUV
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Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/products/euv-lithography-systems/twinscan-exe-5000
- Evidence from asml.comhttps://www.asml.com/en/news/press-releases/2026/intel-foundry-and-asml-collaborate-to-accelerate-industry-readiness-for-high-na-euv