Definition
A silicon-nitride sidewall spacer formed adjacent to transistor gate sidewalls, typically by conformal nitride deposition followed by anisotropic etch.
Application
Used as a dielectric/process spacer and implantation mask to offset source/drain implants and control transistor junction geometry; not every semiconductor spacer is nitride.
Related search terms
silicon nitride spacer
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Related concepts
Evidence and further reading
- Evidence from patents.google.comhttps://patents.google.com/patent/US7678679B2/en
- Evidence from patents.google.comhttps://patents.google.com/patent/US6902971B2/en