Definition
In semiconductor processing, a deposited film feature, commonly on a patterned sidewall, used to protect adjacent material, set dopant placement, or define a self-aligned pattern.
Application
Used around transistor gates during implantation and as pattern-defining sidewall features in self-aligned double or quadruple patterning.
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Evidence and further reading
- Evidence from lamresearch.comhttps://www.lamresearch.com/technical-glossary/
- Evidence from newsroom.lamresearch.comhttps://newsroom.lamresearch.com/Tech-Brief-FinFET-Fundamentals