Definition
A spacer-based process that doubles line density by forming sidewall spacers on lithographically patterned features, removing those original features, and using the remaining spacers for pattern transfer.
Application
Used to create dense line/space patterns beyond single-exposure lithographic pitch limits, including patterns for memory devices.
Related concepts
Evidence and further reading
- Evidence from lamresearch.comhttps://www.lamresearch.com/technical-glossary/
- Evidence from ir.appliedmaterials.comhttps://ir.appliedmaterials.com/news-releases/news-release-details/applied-materials-releases-ace-oxide-spacer-system-enable/