Definition
A pellicle is a thin membrane mounted above a lithography photomask or reticle to intercept contamination so particles remain out of focus and do not print as wafer defects.
Application
Used to protect masks during high-volume lithography; EUV pellicles must also provide high EUV transmission and tolerate scanner power and thermal loads.
Related concepts
Evidence and further reading
- Evidence from imec-int.comhttps://www.imec-int.com/en/press/imec-demonstrates-cnt-pellicle-utilization-euv-scanner
- Evidence from imec-int.comhttps://www.imec-int.com/en/press/imec-and-mitsui-chemicals-sign-strategic-partnership-agreement-commercialize-cnt-pellicle