Definition
A photomask is a patterned plate used in lithography to encode circuit features that are optically transferred or projected into photoresist on a wafer.
Application
Used as the pattern source for semiconductor lithography, including advanced DUV and EUV manufacturing where mask format and mask features affect imaging and productivity.
Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/en/news/press-releases/2026/tsmc-and-asml-announce-industry-transition-to-large-format-photomasks-for-high-na-euv
- Evidence from asml.comhttps://www.asml.com/en/company/stories/2022/the-euv-pellicle-indistinguishable-from-magic