Definition
For mask-pattern transfer in semiconductor fabrication, process margin is the allowable variation of a specified process parameter for which the dimensional error of the resulting pattern relative to its design stays within the permitted range.
Application
Used to evaluate tolerance to exposure-dose and focus variation in mask-pattern transfer. In back-end-of-line (BEOL) overlay metrology, a separately defined margin metric is used to identify via-open risk and guide process improvement.
Related search terms
Process latitude; Manufacturing margin
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Related concepts
Evidence and further reading
- Evidence from patents.google.comhttps://patents.google.com/patent/US8146022B2/en
- Evidence from pdf.comhttps://www.pdf.com/wp-content/uploads/2022/04/PublishedPaper_New_BEOL_OVL_Metrology_HICC_PDFS_EDTM2022_Proc.pdf