Profilometry

12 Metrology, Inspection & Characterization

Definition

Profilometry is the measurement of surface topography using contact-stylus or non-contact optical profiling methods to characterize vertical surface features such as step height, roughness, and profile shape.

Application

Used in semiconductor process development and control to measure etched or deposited step heights and CMP-related topography such as dishing, erosion, and bump height.

Related search terms

Surface profilometry; Surface profiling

Search phrases help you find this entry; their meaning depends on the context shown here.

Related concepts

Evidence and further reading

  • Evidence from ir.kla.comhttps://ir.kla.com/news-events/press-releases/detail/363/kla-tencor-drives-semiconductor-profiling-technology-to
  • Evidence from nist.govhttps://www.nist.gov/laboratories/tools-instruments/nanofab-tool-sensofar-optical-profilometer