Definition
The rate of change of wafer temperature during a thermal cycle, commonly expressed in degrees Celsius per second for heating or cooling ramps.
Application
Specified in rapid thermal processing recipes to control how quickly a wafer enters and leaves high-temperature conditions, helping limit thermal exposure during steps such as spike annealing and junction activation.
Related search terms
Temperature ramp rate
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Evidence and further reading
- Evidence from ir.appliedmaterials.comhttps://ir.appliedmaterials.com/news-releases/news-release-details/applied-materials-leads-advancement-rtp-new-xeplus-system
- Evidence from ir.appliedmaterials.comhttps://ir.appliedmaterials.com/news-releases/news-release-details/applied-materials-takes-rtp-technology-next-level-new-radiance