Definition
In semiconductor optical metrology, a technique that infers feature dimensions and profiles by comparing light scattered or diffracted by patterned structures with optical-model predictions, commonly using periodic targets.
Application
Used to monitor patterned-feature width, height and sidewall geometry during lithography and etch process control.
Related search terms
optical scatterometry
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Related concepts
Evidence and further reading
- Evidence from nist.govhttps://www.nist.gov/programs-projects/optical-grating-scatterometry
- Evidence from toptica.comhttps://www.toptica.com/applications/semicon-inspection-metrology/optical-scatterometry