Definition
In wet processing, a dissolved surface-active substance that lowers interfacial tension and preferentially accumulates at interfaces.
Application
Added to wafer-cleaning solutions to aid particle removal; for example, nonionic surfactants are used in dilute ammonium hydroxide cleaning of hydrophobic silicon.
Related search terms
Surface Active Agent
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Related concepts
Evidence and further reading
- Evidence from nvlpubs.nist.govhttps://nvlpubs.nist.gov/nistpubs/Legacy/SP/nistspecialpublication960-3.pdf
- Evidence from cir.nii.ac.jphttps://cir.nii.ac.jp/crid/1390001206251595264