Definition
An X-ray thin-film analysis method that models specular reflected intensity as a function of grazing incidence angle to estimate layer thickness, density and surface or interface roughness.
Application
Used to characterize silicon nitride films on silicon wafers and develop semiconductor thin-film thickness reference materials.
Related search terms
X-ray reflectometry
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Related concepts
Evidence and further reading
- Evidence from rigaku.comhttps://rigaku.com/hubfs/2024%20Rigaku%20Global%20Site/Resource%20Hub/Knowledge%20Library/Rigaku%20Journals/Volume%2026%282%29%20-%20Summer%202010/RJ26-2_1-9.pdf?hsLang=en
- Evidence from tsapps.nist.govhttps://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=909798