Definition
The condition in an ALD half-reaction where available reactive surface sites are filled so additional precursor or reactant exposure no longer produces a meaningful increase in growth per cycle.
Application
Used to verify self-limiting ALD behavior and to optimize precursor dose, purge timing and process throughput without sacrificing thickness control.
Related search terms
Surface saturation in ALD
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Related concepts
Evidence and further reading
- Evidence from asm.comhttps://www.asm.com/our-technology-products/ald
- Evidence from newsroom.lamresearch.comhttps://newsroom.lamresearch.com/Nanoscale-Features-through-Atomic-Scale-Processing