Definition
The temperature range for a particular ALD chemistry in which the surface reactions operate in a controlled self-limiting regime; outside the range, condensation, insufficient reaction, desorption or decomposition can disrupt ideal ALD behavior.
Application
Used during ALD process development to choose a deposition temperature that preserves self-limiting growth and suitable film properties for the precursor/reactant system.
Related search terms
ALD temperature window
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Related concepts
Evidence and further reading
- Evidence from doi.orghttps://doi.org/10.1088/2631-7990/acd88e
- Evidence from asm.comhttps://www.asm.com/our-technology-products/ald