Definition
A specially designed patterned reference feature on the wafer that an alignment sensor measures to determine wafer position before lithographic exposure.
Application
Used by DUV and EUV lithography systems to calculate wafer position and support accurate layer-to-layer alignment and overlay.
Related search terms
Alignment marker
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Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/en/company/stories/2021/fellow-simon-mathijssen-aligning-lithography-nanometer
- Evidence from asml.comhttps://www.asml.com/en/products/duv-lithography-systems/twinscan-nxt2100i