Definition
The lithography operation of determining and correcting wafer or reticle position so a new pattern is placed in the intended relationship to previously formed features.
Application
Used before exposure to position wafers and reticles accurately enough to achieve the required layer-to-layer overlay in semiconductor manufacturing.
Related search terms
Wafer alignment; reticle alignment
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Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/en/company/stories/2021/fellow-simon-mathijssen-aligning-lithography-nanometer
- Evidence from asml.comhttps://www.asml.com/en/technology/lithography-principles/measuring-accuracy