Definition
A wet silicon-oxide etchant based on hydrofluoric acid buffered with a fluoride salt, commonly ammonium fluoride, to provide controlled and more stable oxide-etch behavior.
Application
Used to remove or pattern silicon oxide, including native or deposited oxide films, in wet benches before subsequent fabrication steps while maintaining a controlled etch chemistry.
Related search terms
Buffered HF; buffered hydrofluoric acid etch
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Related concepts
Evidence and further reading
- Evidence from nist.govhttps://www.nist.gov/laboratories/tools-instruments/nanofab-tool-reynolds-rca-wet-bench
- Evidence from nvlpubs.nist.govhttps://nvlpubs.nist.gov/nistpubs/Legacy/SP/nbsspecialpublication400-53.pdf