Design Rule

05 Lithography & Mask Technology

Definition

A manufacturing-derived geometric or patterning constraint that an IC layout must satisfy, such as minimum width, spacing, enclosure, overlap or density requirements for a specific process technology.

Application

Encoded in foundry rule decks and PDKs and used during layout and physical verification to keep geometry within manufacturable limits; advanced nodes add context-dependent and pattern-based constraints beyond simple minimum dimensions.

Related search terms

Layout design rule; foundry design rule

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Related concepts

Evidence and further reading