Mask Blank

05 Lithography & Mask Technology

Definition

Unpatterned prepared substrate and coating stack from which a photomask is fabricated; construction depends on mask technology.

Application

Used as the starting material for lithography masks; EUV mask blanks use specialized low-thermal-expansion substrates and reflective multilayer coatings before patterning.

Related search terms

photomask blank; EUV mask blank

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Related concepts

Evidence and further reading