Definition
Sensitivity ratio describing how a dimensional error or change on a mask maps into a change in the printed resist or wafer feature after accounting for projection reduction.
Application
Used in lithography process control and OPC assessment to quantify amplification of mask dimensional errors in printed features.
Related search terms
MEF; mask error factor
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Related concepts
Evidence and further reading
- Evidence from goldbook.iupac.orghttps://goldbook.iupac.org/terms/view/09525
- Evidence from lithoguru.comhttps://www.lithoguru.com/scientist/glossary/M.html