Definition
A lithography illumination mode that directs illumination through selected non-central angles of the projection pupil rather than only conventional on-axis illumination.
Application
Used in production optical lithography to tailor imaging of selected pattern pitches and orientations; modern KrF scanners provide configurable conventional and off-axis illumination modes.
Related search terms
off-axis illumination; oblique illumination
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Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/en/products/duv-lithography-systems/twinscan-nxt870
- Evidence from asml.comhttps://www.asml.com/en/products/duv-lithography-systems/twinscan-xt860n