Definition
Sputter deposition performed with a reactive gas, typically oxygen or nitrogen, present in the plasma so sputtered target material reacts to form a compound thin film.
Application
Used to deposit compound films such as metal oxides and nitrides; reactive-gas flow or partial pressure is controlled to tune film composition and stoichiometry.
Related search terms
Reactive sputter deposition
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Related concepts
Evidence and further reading
- Evidence from plasmatherm.comhttps://www.plasmatherm.com/product/endeavor/
- Evidence from angstromsciences.comhttps://angstromsciences.com/reactive-sputtering