Definition
Thin-film deposition by ion bombardment of a target powered with radio-frequency excitation, allowing sputtering of insulating as well as conductive target materials.
Application
Deposits films from insulating targets, including oxides and nitrides, and can also deposit conductive films from metal targets.
Related search terms
radio-frequency sputtering
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Related concepts
Evidence and further reading
- Evidence from angstromengineering.comhttps://angstromengineering.com/tech/magnetron-sputtering/rf-sputtering/
- Evidence from lesker.comhttps://www.lesker.com/newweb/process_instruments/processequipment_technotes.cfm