Definition
A thin-film coating method in which liquid is dispensed onto a substrate and rotation spreads and thins it, with solvent evaporation contributing to film formation.
Application
Used to coat wafers with photoresist before lithographic exposure; resist formulation, spin conditions, and solvent drying influence the resulting film thickness and uniformity.
Related concepts
Evidence and further reading
- Evidence from microchemicals.comhttps://www.microchemicals.com/dokumente/application_notes/spin_coating_photoresist.pdf
- Evidence from ossila.comhttps://www.ossila.com/pages/spin-coating