Definition
A light-absorbing or optically tuned coating placed beneath photoresist to suppress reflections from the underlying wafer stack during lithographic exposure.
Application
Used to reduce standing waves, reflective notching and critical-dimension variation, improving lithography process windows and pattern fidelity in i-line, DUV and 193-nm processes.
Related search terms
Bottom antireflective coating; bottom ARC
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Related concepts
Evidence and further reading
- Evidence from brewerscience.comhttps://www.brewerscience.com/products/arc/
- Evidence from brewerscience.comhttps://brewerscience.com/products/tarc-vs-barc/