Definition
Deep-ultraviolet optical lithography that uses an argon-fluoride excimer-laser light source with a wavelength of approximately 193 nm.
Application
Used in dry and immersion scanners to pattern critical and mid-critical semiconductor layers, with multiple-patterning techniques extending 193 nm lithography to dimensions well below the exposure wavelength.
Related search terms
Argon-fluoride lithography; 193 nm lithography
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Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/en/technology/lithography-principles/light-and-lasers
- Evidence from asml.comhttps://www.asml.com/en/company/stories/2023/how-immersion-lithography-saved-moores-law