Definition
A lithography exposure system that prints a reticle pattern by synchronizing reticle and wafer motion during a slit-scanning exposure.
Application
Used to repeatedly print chip patterns at multiple wafer locations during semiconductor fabrication.
Related search terms
lithography scanner; step-and-scan system; step-and-scan lithography tool
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Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/en/technology/lithography-principles/mechanics-and-mechatronics
- Evidence from asml.comhttps://www.asml.com/en/company/stories/2023/seven-things-about-our-wilton-history