Definition
A projection-lithography tool that repeats reticle-pattern exposures at successive substrate positions, conventionally by step-and-repeat operation.
Application
Used to transfer aligned photomask patterns onto wafers in microfabrication.
Related concepts
Evidence and further reading
- Evidence from nist.govhttps://www.nist.gov/laboratories/tools-instruments/nanofab-tool-asml-pas5500275d-stepper
- Evidence from cnfusers.cornell.eduhttps://www.cnfusers.cornell.edu/node/35