Definition
Optical photolithography using deep-ultraviolet exposure wavelengths; semiconductor production commonly uses krypton-fluoride (KrF) light at 248 nm and argon-fluoride (ArF) light at 193 nm.
Application
Used for high-volume patterning of many wafer layers. ArF dry or immersion tools address finer features while mature KrF systems remain common for less demanding layers, often combined with resolution-enhancement and multiple-patterning techniques.
Related search terms
DUV lithography; deep-UV photolithography
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Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/en/technology/lithography-principles/light-and-lasers
- Evidence from asml.comhttps://www.asml.com/en/products/duv-lithography-systems/twinscan-nxt870