Definition
A compound of tantalum and nitrogen, denoted TaN, that is used in semiconductor thin films.
Application
Used as a thin-film diffusion barrier between copper and silicon in semiconductor metallization.
Related concepts
Evidence and further reading
- Evidence from scholar.nycu.edu.twhttps://scholar.nycu.edu.tw/en/publications/comparison-of-the-diffusion-barrier-properties-of-chemical-vapor-/
- Evidence from arxiv.orghttps://arxiv.org/abs/cond-mat/0305683