Definition
High-NA EUV projection optics that use different magnification in the scan and non-scan directions, enabling the higher numerical aperture while preserving compatibility with standard reticle dimensions.
Application
Used in ASML's 0.55-NA High-NA EUV platform to achieve smaller printed features while limiting the impact of the new optical architecture on the reticle ecosystem.
Related search terms
Anamorphic projection optics
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Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/products/euv-lithography-systems/twinscan-exe-5000
- Evidence from asml.comhttps://www.asml.com/en/news/press-releases/2024/asml-imec-opening-high-na-euv-lithography-lab