Definition
A photoresist system in which exposure generates a catalytic species, typically a photoacid, that drives many chemical reactions during post-exposure bake, amplifying the effect of each absorbed photon.
Application
Used in advanced DUV and EUV lithography because chemical amplification increases resist sensitivity, although photoacid diffusion and stochastic chemistry must be controlled to preserve resolution, critical dimension and line-edge roughness.
Related search terms
Chemically amplified photoresist
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Related concepts
Evidence and further reading
- Evidence from nist.govhttps://www.nist.gov/publications/depth-profiling-chemical-changes-chemically-amplified-resists-euv-lithography
- Evidence from nvlpubs.nist.govhttps://nvlpubs.nist.gov/nistpubs/Legacy/IR/nistir7426.pdf