Definition
Post-exposure bake (PEB) is a controlled thermal step after lithographic exposure that drives exposure-generated resist chemistry before development.
Application
Used especially with chemically amplified resists to control photoacid diffusion and deprotection reactions that affect critical dimension, resolution, and line-edge behavior.
Related search terms
Post exposure bake; Post-exposure baking
Search phrases help you find this entry; their meaning depends on the context shown here.
Related concepts
Evidence and further reading
- Evidence from nist.govhttps://www.nist.gov/publications/super-resolution-optical-measurement-nanoscale-photoacid-distribution-lithographic
- Evidence from nist.govhttps://www.nist.gov/publications/deprotection-reaction-front-profile-model-193-nm-methacrylate-based-chemically