Copper

10 BEOL Interconnect & Metallization

Notation Cu

Definition

A highly conductive metallic element used extensively in semiconductor interconnect and packaging because it offers lower electrical resistivity than aluminum and supports high-current-density wiring when properly integrated.

Application

Used in BEOL lines and vias, electroplated damascene structures, package redistribution layers, copper pillars, TSVs and hybrid-bonding pads. Copper requires compatible barrier, seed, CMP and contamination-control processes.

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Copper metallization

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